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Adsorbate-Dependent Conductivity of MoS2 FETs

Adsorbate-Dependent Conductivity of MoS2 FETs

Lado Filipovic (ORCID: 0000-0003-1687-5058)
  • Grant DOI 10.55776/P35318
  • Funding program Principal Investigator Projects
  • Status ongoing
  • Start March 1, 2023
  • End February 28, 2026
  • Funding amount € 393,488
  • E-mail

Disciplines

Electrical Engineering, Electronics, Information Engineering (40%); Computer Sciences (30%); Materials Engineering (30%)

Keywords

    Molybdenum disulfide, Molecular adsorption, Phonon scattering, Coulomb scattering, Adsorbate-dependent conductivity, Ensemble Monte Carlo

Abstract

Two-dimensional (2D) nanomaterials are heavily being investigated for future applications in physics, chemistry, and nanoelectronics. They appear to exhibit many novel phenomena, not found in their bulk counterparts, even when only a single atomic layer of the material is used in a device. Beyond the well known 2D material graphene, transition metal dichalcogenides (TMDs), such as MoS2 and WS2, appear to provide the ideal properties to fulfill the promise of eventually replacing silicon at the nanoscale. These films provide a sufficiently large band gap, holding a great promise in their use in future digital electronics and in low -power sensing applications. The reduced dimensions ensure a strong impact from surface effects, offering the potential for ultra-sensitive gas- and biosensors. However, this high sensitivity comes with a potential downside: If a change in the molecular make-up of the ambient conditions modifies the material behavior, then devices based upon these materials will be lim ited in their applicability. Therefore, in this project, we will study how small molecules which are typically found in the air around us affect 2D materials and the thereupon based electronic devices. We aim to provide a physical understanding of the adsorption and desorption mechanisms and the preferred adsorption sites for typical ambient molecules, such as H 2, O2, and H 2O, on pristine and defected TMD surfaces. Physical models will be developed which can be used to understand how the presence of various molecules impact the performance of devices and circuits based on these materials. This project requires an interdisciplinary approach, including ab-initio density functional theory (DFT) modeling and ultra-high vacuum x-ray photoelectron spectroscopy (XPS) / scanning tunneling microscopy (STM) characterization to understand the make-up and electrical properties of the 2D materials. A Monte Carlo framework will then be used to calculate the macroscopic conductivity based on the microscopic behavior of charge carriers. Finally, a drift- diffusion model will be devised to enable transient simulations to study the mixed -mode operation of TMD-based devices and circuits.

Research institution(s)
  • Technische Universität Wien - 100%
Project participants
  • Ulrike Diebold, Technische Universität Wien , national collaboration partner

Research Output

  • 1 Citations
  • 5 Publications
Publications
  • 2024
    Title Spline Interpolation-Based Multi-Scale Model for Etching in a Chlorine-Argon Inductively Coupled Plasma
    DOI 10.1109/wsc63780.2024.10838987
    Type Conference Proceeding Abstract
    Author Filipovic L
    Pages 1907-1918
  • 2024
    Title Electron-Electron Scattering in Non-Parabolic Transport Models
    DOI 10.1109/sispad62626.2024.10733120
    Type Conference Proceeding Abstract
    Author Gull J
    Pages 1-4
  • 2024
    Title Automated image acquisition and analysis of graphene and hexagonal boron nitride from pristine to highly defective and amorphous structures
    DOI 10.1038/s41598-024-77740-9
    Type Journal Article
    Author Propst D
    Journal Scientific Reports
    Pages 26939
    Link Publication
  • 2024
    Title Electron-Beam-Induced Adatom-Vacancy-Complexes in Mono- and Bilayer Phosphorene
    DOI 10.1002/admi.202400784
    Type Journal Article
    Author Speckmann C
    Journal Advanced Materials Interfaces
    Link Publication
  • 2024
    Title Loading Effect during SiGe/Si Stack Selective Isotropic Etching for Gate-All-Around Transistors
    DOI 10.1021/acsaelm.4c01462
    Type Journal Article
    Author Shao H
    Journal ACS Applied Electronic Materials
    Pages 8124-8133

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