Synchrotron radiation induced TXRF-applications

Total Reflection X-ray Fluorescence Analysis (TXRF) is a special method of energy dispersive X-ray Fluorescence Analysis extending the analytical power to the ultra trace element range (Detection limits in the pg (10-12 g) range) with X-ray tube excitation. Using Synchrotron radiation (SR) as exciting radiation with its features, like wide spectral range, natural collimation and high intensity allows to reduce the detection limits down to the fg(10-15 g) range. Using a high resolution crystal monochromator instead of a multilayer monochromator Absorption spectroscopy ( XANES, EXAFS) can be performed allowing speciation of trace elements and determination of the chemical environment. The aim of the project is to show the power of the new developed trace analytical technique SR-TXRF and ist applicability to various problems. At HASYLAB, Hamburg, Beamline L a vacuum SR-TXRF chamber has been installed by the Atominstitute group which can be used to perform TXRF trace analysis (cooperation with Dr. Falkenberg, HASYLAB). A 3 years proposal has been accepted there provinding every year about 2 weeks of beamtime. 6 topics should be investigated: Optimization of geometry for absorption spectroscopy in TXRF geometry cooperation with ITC-irst ( Dr. Pepponi), Trento Analysis of impacted aerosols and XANES to determine oxidation state cooperation with Inst. of Anal.and Applied Chemistry, Univ. Hamburg ( Prof. Broekaert) Determination of the oxidation state of As in xylem sap of plants by SR-TXRF cooperation with Inst. of Anal. and Applied Chemistry, Eötvös Univ. Budapest ( Prof.Zaray) Depth profiling and absolute dose determination of Indium implants in Si wafers cooperation with ITC-irst, ( Dr. Pepponi), Trento, I Characterisation of Arsenic Ultra Shallow Junctions by Grazing Incidence Fluorescence EXAFS, cooperation with ITC-irst ( Dr. Pepponi) XANES on Wafer surface contamination to determine oxidation state cooperation with IBM hHopewel Junction, US ( MaryAnn Zaitz) The application of SR-TXRF to the different problems will give the opportunity to characterize and validate the newly developed technique for applications such as depth profiling, x-ray absorption measurements and their combination, in order to show the potentialities of the techniques to possible users from research and industry.

Total Reflection X-ray Fluorescence Analysis (TXRF) is a special method of energy dispersive X-ray Fluorescence Analysis extending the analytical power to the ultra trace element range (Detection limits in the pg (10-12 g) range) with X-ray tube excitation. Using Synchrotron radiation (SR) as exciting radiation with its features, like wide spectral range, natural collimation and high intensity allows to reduce the detection limits down to the fg(10-15 g) range. Using a high resolution crystal monochromator instead of a multilayer monochromator Absorption spectroscopy ( XANES, EXAFS) can be performed allowing speciation of trace elements and determination of the chemical environment. The aim of the project is to show the power of the new developed trace analytical technique SR-TXRF and ist applicability to various problems. At HASYLAB, Hamburg, Beamline L a vacuum SR-TXRF chamber has been installed by the Atominstitute group which can be used to perform TXRF trace analysis (cooperation with Dr. Falkenberg, HASYLAB). A 3 years proposal has been accepted there provinding every year about 2 weeks of beamtime. 6 topics should be investigated: Optimization of geometry for absorption spectroscopy in TXRF geometry cooperation with ITC-irst ( Dr. Pepponi), Trento Analysis of impacted aerosols and XANES to determine oxidation state cooperation with Inst. of Anal.and Applied Chemistry, Univ. Hamburg ( Prof. Broekaert) Determination of the oxidation state of As in xylem sap of plants by SR-TXRF cooperation with Inst. of Anal. and Applied Chemistry, Eötvös Univ. Budapest ( Prof.Zaray) Depth profiling and absolute dose determination of Indium implants in Si wafers cooperation with ITC-irst, ( Dr. Pepponi), Trento, I Characterisation of Arsenic Ultra Shallow Junctions by Grazing Incidence Fluorescence EXAFS, cooperation with ITC-irst ( Dr. Pepponi) XANES on Wafer surface contamination to determine oxidation state cooperation with IBM hHopewel Junction, US ( MaryAnn Zaitz) The application of SR-TXRF to the different problems will give the opportunity to characterize and validate the newly developed technique for applications such as depth profiling, x-ray absorption measurements and their combination, in order to show the potentialities of the techniques to possible users from research and industry.