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Two-Component Monolayer Glues

Two-Component Monolayer Glues

Helmuth Hoffmann (ORCID: )
  • Grant DOI 10.55776/P14846
  • Funding program Principal Investigator Projects
  • Status ended
  • Start March 1, 2001
  • End February 28, 2004
  • Funding amount € 64,193
  • Project website

Disciplines

Chemistry (80%); Physics, Astronomy (20%)

Keywords

    MONOLAYER GLUES, INFRARED SPECTROSCOPY, SELF-ASSEMBLED MONOLAYERS, WAFER BONDING

Abstract

The present proposal is based on the fundamental question of how two pieces of solid can be joined under mild, normal laboratory conditions (room temperature, normal atmosphere) by chemical activation of their surfaces. The ideal process would simply be the reverse of crystal cleavage, i.e. joining two solids with perfectly clean, flat surfaces by simply pressing them together, which - under exertion of cohesive forces between the surface atoms - should result in a single, interface-free piece of solid. In practice, this ideal has been closely approximated in a process known as wafer bonding, where two silicon wafers with native oxide layers can be bonded irreversibly via a condensation reaction between the surface hydroxyl groups. Despite the successful application of this bonding method for the fabrication of novel microelectronic and micromachined devices, two serious drawbacks limit the further exploitation of this technology: First, high temperature annealing up to 1200 C is required to drive this condensation reaction to completion, which precludes the use of temperature-sensitive components (heteregeneous junctions, doped layer profiles, low-melting metal layers, etc.). Second, water is produced as a side product of the interface bonding reaction, which usually causes bonding defects such as interface voids or bubbles and reduces the bonding strength. The goal of this research project is therefore the development of a new low-temperature bonding process based on the following concept: The two substrates are coated before bonding with monomolecular glue layers terminated by appropriate pairs of surface functional groups, which undergo spontaneous addition reactions upon contacting the surfaces to form a strong, irreversible linkage between the substrates. The principal idea behind this proposal is therefore the replacement of the condensation reaction between surface hydroxyl groups in the conventional wafer bonding process by thermodynamically and kinetically more favorable addition reactions between suitable pairs of activated precursor surfaces, which, in addition to the desired quantitative conversion at room temperature, produce no troublesome side products. A novel spectroscopic technique (Infrared Internal Transmission Spectroscopy) shall be used to monitor the interface bonding reactions between the solid substrates and should allow for a specific selection and fine-tuning of the most suitable glue layer composition and contribute to a better understanding of the molecular basis behind the bonding process.

Research institution(s)
  • Technische Universität Wien - 100%

Research Output

  • 310 Citations
  • 4 Publications
Publications
  • 2020
    Title Genetic Components of 25-Hydroxyvitamin D Increase in Three Randomized Controlled Trials
    DOI 10.3390/jcm9020570
    Type Journal Article
    Author Trummer O
    Journal Journal of Clinical Medicine
    Pages 570
    Link Publication
  • 2004
    Title IR Reflection Spectra of Monolayer Films Sandwiched between Two High Refractive Index Materials †
    DOI 10.1021/la0492916
    Type Journal Article
    Author Lummerstorfer T
    Journal Langmuir
    Pages 6542-6545
  • 2003
    Title Atomic Force Microscopy Investigation of the Growth of Different Alkylsiloxane Monolayers from Highly Concentrated Solutions
    DOI 10.1021/la026646h
    Type Journal Article
    Author Foisner J
    Journal Langmuir
    Pages 3741-3746
  • 2004
    Title Click Chemistry on Surfaces: 1,3-Dipolar Cycloaddition Reactions of Azide-Terminated Monolayers on Silica
    DOI 10.1021/jp049601t
    Type Journal Article
    Author Lummerstorfer T
    Journal The Journal of Physical Chemistry B
    Pages 3963-3966

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