Ion Multi Beam Lithography, (IMBL)

Ion Multi Beam Lithography, (IMBL)

Elmar Platzgummer (ORCID: )

Disciplines

Electrical Engineering, Electronics, Information Engineering (75%); Physics, Astronomy (25%)

Keywords

    MIKROLITHOGRAPHIE, IONENSTRAHLTECHNIK, NANOTECHNIK

Research institution(s)
Project participants
  • Hans Löschner, associated research partner